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		Sputtering materials for VLSI and thin film devices by Sarkar, Jaydeep. Language: English Publication details: Walthem William Andrew 2013Availability: Items available for loan: 1 Call number: 621.382:539.23 Sar. Lists: Display List 03/12/2018-09/12/2018. Place hold Add to cart (remove)
		Thin films material technology : sputtering of compound materials by Wasa, Kiyotaka \| Kitabatake, Makoto [Author] \| Adachi, Hideaki [Author]. Language: English Publication details: New York William Andrew Pub. 2004Availability: Items available for loan: 1 Call number: 621.382:539.23 Was(2). Lists: Display List 04/02/2019-10/02/2019. Place hold Add to cart (remove)
		Thin film and depth profile analysis by Oechsner, H [Editor]. Series: Topics in current physics ; 37 Language: English Publication details: Berlin Springer-Verlag 1984Availability: Items available for loan: 1 Call number: 539.23 Thi(2). Lists: Display List 04/02/2019-10/02/2019. Place hold Add to cart (remove)
		No cover image available Study of Si-Doped GaN and InxGa1-xN epitaxial films grown by reactive co-sputtering (R) by Mohan, Shyam \| Major, S.S [Supervisor] \| Indian Institute of Technology Bombay. Department of Physics. Material type: Text; Format: print ; Literary form: Not fiction Language: English Publication details: Mumbai IIT 2020Dissertation note: Thesis Ph.D. Indian Institute of Technology Bombay. Department of Physics 2020 Availability: Items available for reference: Not for loan (1) Call number: 539.23 Moh. Lists: New Arrivals : Display Theses List from 05/04/2021-11/04/2021. Add to cart (remove)

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