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Numerical simulation of MOS devices under radiation (R)

by Vasudevan, Vinita [Author] | Vasi, J [ Supervisor] | Indian Institute of Technology Bombay. Department of Electrical Engineering.

Language: English Publication details: Bombay IIT 1992Dissertation note: Thesis Ph.D. Indian Institute of Technology Bombay. Department of Electrical Engineering 1992 Availability: Items available for reference: Not for loan (1) Call number: 043:621.382:539.16:518.6 Vas.

Traps and trap generation in ultrathin jet vapor deposited, JVD, silicon nitride gate dielectrics (R)

by ManjulaRani, K.N [Author] | Vasi, J.M [Supervisor] | Ramgopal Rao, V [Supervisor] | Indian Institute of Technology Bombay Department of Electrical Engineering.

Language: English Publication details: Bombay IIT 2004Dissertation note: Thesis Ph.D Indian Institute of Technology Bombay. Department of Electrical Engineering 2004 Availability: Items available for reference: Not for loan (1) Call number: 043:621.382.3:621.315.61 Man.

Study of thin N2O gate oxides for MOS devices (R)

by Subrahmanyam, P.V.S [Author] | Vasi, J.M [Supervisor] | Indian Institute of Technology Bombay. Department of Electrical Engineering.

Language: English Publication details: Mumbai IIT 1999Dissertation note: Thesis Ph.D. Indian Institute of Technology Bombay. Department of Electrical Engineering 1999 Availability: Items available for reference: Not for loan (1) Call number: 043:621.382 Sub.

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