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Numerical simulation of MOS devices under radiation (R) by
Language: English
Publication details: Bombay IIT 1992
Dissertation note: Thesis Ph.D. Indian Institute of Technology Bombay. Department of Electrical Engineering 1992
Availability: Items available for reference: Central Library, IITB: Not for loan (1)Call number: 043:621.382:539.16:518.6 Vas.

Traps and trap generation in ultrathin jet vapor deposited, JVD, silicon nitride gate dielectrics (R) by
Language: English
Publication details: Bombay IIT 2004
Dissertation note: Thesis Ph.D Indian Institute of Technology Bombay. Department of Electrical Engineering 2004
Availability: Items available for reference: Central Library, IITB: Not for loan (1)Call number: 043:621.382.3:621.315.61 Man.

Study of thin N2O gate oxides for MOS devices (R) by
Language: English
Publication details: Mumbai IIT 1999
Dissertation note: Thesis Ph.D. Indian Institute of Technology Bombay. Department of Electrical Engineering 1999
Availability: Items available for reference: Central Library, IITB: Not for loan (1)Call number: 043:621.382 Sub.