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		No cover image available Growth kinetics and electrical properties of silicon dioxide films grown in an inductively coupled RF plasma anodization reactor (R) by Choksi, Asheesh J [Author] \| Chandorkar, Arun N [ Supervisor] \| Indian Institute of Technology Bombay. Department of Electrical Engineering. Language: English Publication details: Bombay IIT 1991Dissertation note: Thesis Ph.D. Indian Institute of Technology Bombay. Department of Electrical Engineering 1991 Availability: Items available for reference: Not for loan (1) Call number: 043:621.382:537.56 Cho. Add to cart (remove)
		No cover image available Study of thin N2O gate oxides for MOS devices (R) by Subrahmanyam, P.V.S [Author] \| Vasi, J.M [Supervisor] \| Indian Institute of Technology Bombay. Department of Electrical Engineering. Language: English Publication details: Mumbai IIT 1999Dissertation note: Thesis Ph.D. Indian Institute of Technology Bombay. Department of Electrical Engineering 1999 Availability: Items available for reference: Not for loan (1) Call number: 043:621.382 Sub. Add to cart (remove)

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