Simulation of the hot wire CVD process of Si:H thin film deposition (R)

By: Dinesh ChandraContributor(s): Dusane, R.O. and Viswanathan, N.NLanguage: English Series: Publication details: Mumbai ; IIT ; 2004Edition: Description: vi,59 p; 30 cmISBN: Subject(s): Dusane, R.O. and Viswanathan, N.N | Theses and Dissertations | Thin films , Chemical vapour deposition , Silane
Star ratings
    Average rating: 0.0 (0 votes)
Holdings
Item type Current library Call number Status Notes Date due Barcode Item holds
Theses and Dissertations Theses and Dissertations Central Library, IITB
043:669.782:539.23Din Not for loan D06B07 202455
Total holds: 0

There are no comments on this title.

to post a comment.
Share

Powered by Koha