Development of low-k dielectric thin films for VLSI circuit applications (R)

By: Srivastava, Akhilesh KumarContributor(s): Dusane, Rajiv OLanguage: English Series: Publication details: Mumbai ; IIT ; 2003Edition: Description: v,48 p; 30 cmISBN: Subject(s): Dusane, Rajiv O | Theses and Dissertations | Silicon oxide films , Thin films , Integrated circuits-Very large scale integration
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Item type Current library Call number Status Notes Date due Barcode Item holds
Theses and Dissertations Theses and Dissertations Central Library, IITB
043:621.372:621.382Sri Not for loan D06B07 199132
Total holds: 0

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