Development of low-k dielectric thin films for VLSI circuit applications (R)

Srivastava, Akhilesh Kumar

Development of low-k dielectric thin films for VLSI circuit applications (R) - - Mumbai IIT 2003 - v,48 p. 30 cm - .




Dusane, Rajiv O.
Theses and Dissertations
Silicon oxide films , Thin films , Integrated circuits-Very large scale integration

043:621.372:621.382Sri

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