Investigation on ICPCVD silicon nitride for sub 100 nm MOSFET and MEMS application (R)
Language: English Series: Publication details: Mumbai ; IIT ; 2009Edition: Description: ix,66 p; 30 cmISBN: Subject(s): Pinto, R | Theses and Dissertations | Metal oxide semiconductor field-effect transistors , Chemical vapor deposition , Silicon nitride , X-rays dittraction| Item type | Current library | Call number | Status | Notes | Date due | Barcode | Item holds |
|---|---|---|---|---|---|---|---|
Theses and Dissertations
|
Central Library, IITB | 043:681.382.3Min | Not for loan | D03B28 | 224353 |
Total holds: 0
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