Investigation on ICPCVD silicon nitride for sub 100 nm MOSFET and MEMS application (R)
Minj, Albert
Investigation on ICPCVD silicon nitride for sub 100 nm MOSFET and MEMS application (R) - - Mumbai IIT 2009 - ix,66 p. 30 cm - .
Pinto, R.
Theses and Dissertations
Metal oxide semiconductor field-effect transistors , Chemical vapor deposition , Silicon nitride , X-rays dittraction
043:681.382.3Min
Investigation on ICPCVD silicon nitride for sub 100 nm MOSFET and MEMS application (R) - - Mumbai IIT 2009 - ix,66 p. 30 cm - .
Pinto, R.
Theses and Dissertations
Metal oxide semiconductor field-effect transistors , Chemical vapor deposition , Silicon nitride , X-rays dittraction
043:681.382.3Min