Low temperature silicon nitride (Si3N4) by hot wire chemical vapor deposition (HWCVD) (R)
Language: English Series: Publication details: Mumbai ; IIT ; 2001Edition: Description: iii,57 p; 29.5 cmISBN: Subject(s): Rao, V. Ramgopal and Dusane, Rajiv O | Theses and Dissertations | Chemical vapour deposition , Dielectric filmsItem type | Current library | Call number | Status | Notes | Date due | Barcode | Item holds |
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Theses and Dissertations | Central Library, IITB | 043:621.315.6:621.793Wag | Not for loan | D03B13 | 193215 |
Total holds: 0
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