Low temperature silicon nitride (Si3N4) by hot wire chemical vapor deposition (HWCVD) (R)

Waghmare, Parag C.

Low temperature silicon nitride (Si3N4) by hot wire chemical vapor deposition (HWCVD) (R) - - Mumbai IIT 2001 - iii,57 p. 29.5 cm - .




Rao, V. Ramgopal and Dusane, Rajiv O.
Theses and Dissertations
Chemical vapour deposition , Dielectric films

043:621.315.6:621.793Wag

Powered by Koha