Low temperature silicon nitride (Si3N4) by hot wire chemical vapor deposition (HWCVD) (R)
Waghmare, Parag C.
Low temperature silicon nitride (Si3N4) by hot wire chemical vapor deposition (HWCVD) (R) - - Mumbai IIT 2001 - iii,57 p. 29.5 cm - .
Rao, V. Ramgopal and Dusane, Rajiv O.
Theses and Dissertations
Chemical vapour deposition , Dielectric films
043:621.315.6:621.793Wag
Low temperature silicon nitride (Si3N4) by hot wire chemical vapor deposition (HWCVD) (R) - - Mumbai IIT 2001 - iii,57 p. 29.5 cm - .
Rao, V. Ramgopal and Dusane, Rajiv O.
Theses and Dissertations
Chemical vapour deposition , Dielectric films
043:621.315.6:621.793Wag