Physics of submicron lithography
Language: English Series: Publication details: ; New York : Plenum Press, 1992 ; 1992Edition: Description: xi,493 p; 25 cmISBN: 0-306-43578-04Subject(s): | Lithography, Electron beam | X-ray lithography | Ion beam lithography | PhysicsItem type | Current library | Call number | Status | Notes | Date due | Barcode | Item holds |
---|---|---|---|---|---|---|---|
Books | Central Library, IITB | 621.372:621.382 Val | Available | G36A13 | 167132 |
Total holds: 0
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