Characterization of Si3N4, i-poly Si, n-poly Si and SiON, films grown by LPCVD systems (R)
Language: English Series: Publication details: Mumbai ; IIT ; 2009Edition: Description: ix,49 p; 30 cmISBN: Subject(s): Pinto, R | Theses and Dissertations | Chemical vapor deposition , Silicon nitride , Thin films| Item type | Current library | Call number | Status | Notes | Date due | Barcode | Item holds |
|---|---|---|---|---|---|---|---|
Theses and Dissertations
|
Central Library, IITB | 043:621.382:621.793Tir | Not for loan | D03B29 | 224373 |
Total holds: 0
There are no comments on this title.