Characterization of Si3N4, i-poly Si, n-poly Si and SiON, films grown by LPCVD systems (R)
Tirpude, Navneet
Characterization of Si3N4, i-poly Si, n-poly Si and SiON, films grown by LPCVD systems (R) - - Mumbai IIT 2009 - ix,49 p. 30 cm - .
Pinto, R.
Theses and Dissertations
Chemical vapor deposition , Silicon nitride , Thin films
043:621.382:621.793Tir
Characterization of Si3N4, i-poly Si, n-poly Si and SiON, films grown by LPCVD systems (R) - - Mumbai IIT 2009 - ix,49 p. 30 cm - .
Pinto, R.
Theses and Dissertations
Chemical vapor deposition , Silicon nitride , Thin films
043:621.382:621.793Tir