Preparation and characterization of plasma enhanced chemical vapor deposited silicon dioxide and poly-oxide films (R)
Language: English Series: Publication details: Bombay ; IIT ; 1991Edition: Description: 207 p; 27 cmISBN: 0Subject(s): Srivastava, C.M. and Khokle, W.S | Theses and Dissertations | Silicon DioxideItem type | Current library | Call number | Status | Notes | Date due | Barcode | Item holds |
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Theses and Dissertations | Central Library, IITB | 043:621.382Dix | Not for loan | D10A01 | 162360 |
Total holds: 0
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