Chemical vapor deposition : thermal and plasma deposition of electronic materials

By: Sivaram, SContributor(s): Language: English Series: Publication details: ; New York : Van Nostrand Reinhold, 1995 ; 1995Edition: Description: xii,292 p; 23.5 cmISBN: 0-442-01079-625Subject(s): | Microelectronics industry | Chemical vapor deposition | Microelectronics-Materials
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Holdings
Item type Current library Call number Status Notes Date due Barcode Item holds
Books Books Central Library, IITB
621.382:621.793 Siv Available G37A17 178734
Total holds: 0

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