Sputtered hafnium dioxide as high-k dielectric for sub 100nm MOSFETs (R)
Language: English Series: Publication details: Mumbai ; IIT ; 2009Edition: Description: v,34 p; 30 cmISBN: Subject(s): Pinto, R | Theses and Dissertations | Metal oxide semiconductor field-effect Transistors , Dielectrics| Item type | Current library | Call number | Status | Notes | Date due | Barcode | Item holds |
|---|---|---|---|---|---|---|---|
Theses and Dissertations
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Central Library, IITB | 043:621.382.3:537.226Sat | Not for loan | D03B28 | 224495 |
Total holds: 0
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