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Sputtered hafnium dioxide as high-k dielectric for sub 100nm MOSFETs (R)

Satish Meena

Sputtered hafnium dioxide as high-k dielectric for sub 100nm MOSFETs (R) - - Mumbai IIT 2009 - v,34 p. 30 cm - .

ISBN:

Subjects--Topical Terms:
Pinto, R.
Theses and Dissertations
Metal oxide semiconductor field-effect Transistors , Dielectrics

Universal Decimal Class. No.: 043:621.382.3:537.226Sat

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