Plasma process induced damage during VLSI device fabrication (R)
Language: English Series: Publication details: Mumbai ; IIT ; 2003Edition: Description: vi,61 p; 30 cmISBN: Subject(s): Dusane, R. O. and Rao, V. Ramgopal | Theses and Dissertations | Microelectronics-Reliability , Plasma devices| Item type | Current library | Call number | Status | Notes | Date due | Barcode | Item holds |
|---|---|---|---|---|---|---|---|
Theses and Dissertations
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Central Library, IITB | 043:621.382:537.56Pra | Not for loan | D06B06 | 199551 |
Total holds: 0
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