Process integration issues with plasma immersion ion implantation for CMOS technologies (R)
Language: English Series: Publication details: Mumbai ; IIT ; 2004Edition: Description: viii,69 p; 30 cmISBN: Subject(s): Dusane, R.O. and Ramgopal Rao, V | Theses and Dissertations | Chemical vapour deposition , Metal oxide semiconductors, Complementary , Silicon nitride coatings| Item type | Current library | Call number | Status | Notes | Date due | Barcode | Item holds |
|---|---|---|---|---|---|---|---|
Theses and Dissertations
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Central Library, IITB | 043:669.782:621.382Jos | Not for loan | D06B07 | 202964 |
Total holds: 0
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