Process integration issues with plasma immersion ion implantation for CMOS technologies (R)
Joshi, Anand
Process integration issues with plasma immersion ion implantation for CMOS technologies (R) - - Mumbai IIT 2004 - viii,69 p. 30 cm - .
Dusane, R.O. and Ramgopal Rao, V.
Theses and Dissertations
Chemical vapour deposition , Metal oxide semiconductors, Complementary , Silicon nitride coatings
043:669.782:621.382Jos
Process integration issues with plasma immersion ion implantation for CMOS technologies (R) - - Mumbai IIT 2004 - viii,69 p. 30 cm - .
Dusane, R.O. and Ramgopal Rao, V.
Theses and Dissertations
Chemical vapour deposition , Metal oxide semiconductors, Complementary , Silicon nitride coatings
043:669.782:621.382Jos