Preparation and characterization of plasma enhanced chemical vapor deposited silicon dioxide and poly-oxide films (R)

By: Dixit, B.BContributor(s): Srivastava, C.M. and Khokle, W.SLanguage: English Series: Publication details: Bombay ; IIT ; 1991Edition: Description: 207 p; 27 cmISBN: 0Subject(s): Srivastava, C.M. and Khokle, W.S | Theses and Dissertations | Silicon Dioxide
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Holdings
Item type Current library Call number Status Notes Date due Barcode Item holds
Theses and Dissertations Theses and Dissertations Central Library, IITB
043:621.382Dix Not for loan D10A01 162360
Total holds: 0

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