Principles of plasma discharges and materials processing

By: Lieberman, Michael AContributor(s): Lichtenberg, Allan J | Language: English Series: Publication details: Hoboken ; John Wiley ; 2005Edition: 2nd edDescription: xxxv,757; 24 cmISBN: 978-0-471-72001-0Subject(s): | Physics | Plasma dynamics , Plasma etching , Thin films-Surfaces , Plasma chemistry-Industrial applications
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Item type Current library Call number Status Notes Date due Barcode Item holds
Books Books Central Library, IITB
537.56Lie(2) Available G20A15 230786
Total holds: 0

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