Optimization of phosphorus and boron dopant profiles using plasma immersion ion implantation (R)
Language: English Series: Publication details: Mumbai ; IIT ; 2013Edition: Description: 38 p; 30 cmISBN: Subject(s): Pinto, Richard | Theses and Dissertations | Semiconductors , Ion implantationItem type | Current library | Call number | Status | Notes | Date due | Barcode | Item holds |
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Theses and Dissertations | Central Library, IITB | 043:621.382Rat | Not for loan | D04A07 | 234659 |
Total holds: 0
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