Optimization of phosphorus and boron dopant profiles using plasma immersion ion implantation (R)

By: Rathi, AnandContributor(s): Pinto, RichardLanguage: English Series: Publication details: Mumbai ; IIT ; 2013Edition: Description: 38 p; 30 cmISBN: Subject(s): Pinto, Richard | Theses and Dissertations | Semiconductors , Ion implantation
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Holdings
Item type Current library Call number Status Notes Date due Barcode Item holds
Theses and Dissertations Theses and Dissertations Central Library, IITB
043:621.382Rat Not for loan D04A07 234659
Total holds: 0

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