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Optimization of phosphorus and boron dopant profiles using plasma immersion ion implantation (R)

Rathi, Anand

Optimization of phosphorus and boron dopant profiles using plasma immersion ion implantation (R) - - Mumbai IIT 2013 - 38 p. 30 cm - .

ISBN:

Subjects--Topical Terms:
Pinto, Richard
Theses and Dissertations
Semiconductors , Ion implantation

Universal Decimal Class. No.: 043:621.382Rat

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