Low temperature silicon nitride (Si3N4) by hot wire chemical vapor deposition (HWCVD) (R)

By: Waghmare, Parag CContributor(s): Rao, V. Ramgopal and Dusane, Rajiv OLanguage: English Series: Publication details: Mumbai ; IIT ; 2001Edition: Description: iii,57 p; 29.5 cmISBN: Subject(s): Rao, V. Ramgopal and Dusane, Rajiv O | Theses and Dissertations | Chemical vapour deposition , Dielectric films
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Holdings
Item type Current library Call number Status Notes Date due Barcode Item holds
Theses and Dissertations Theses and Dissertations Central Library, IITB
043:621.315.6:621.793Wag Not for loan D03B13 193215
Total holds: 0

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