Development of low dielectric constant thin film for VLSI applications (R)

Singh, Sunil Kumar

Development of low dielectric constant thin film for VLSI applications (R) - - Mumbai IIT 2006 - x,127 p. 30 cm - .




Dusane, Rajiv O.
Theses and Dissertations
Copper , Dielectrics , Thin films , Integrated circuits-Very large scale integration

043:621.372:621.382Sin

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