Growth kinetics and electrical properties of silicon dioxide films grown in an inductively coupled RF plasma anodization reactor (R)

Choksi, Asheesh J.

Growth kinetics and electrical properties of silicon dioxide films grown in an inductively coupled RF plasma anodization reactor (R) - Bombay IIT 1991 - 200 p. 28 cm

Thesis


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Theses and Dissertations
Silicon Dioxide
Metal oxide semiconductors

043:621.382:537.56 / Cho

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