| 000 | 00654 a2200277 4500 | ||
|---|---|---|---|
| 001 | 70969 | ||
| 020 | _a0-442-01079-625 | ||
| 041 | _aeng | ||
| 080 | _a621.382:621.793 Siv | ||
| 245 | _aChemical vapor deposition : thermal and plasma deposition of electronic materials | ||
| 250 | _a | ||
| 260 | _a | ||
| 260 | _bNew York : Van Nostrand Reinhold, 1995 | ||
| 260 | _c1995 | ||
| 300 | _axii,292 p. | ||
| 300 | _c23.5 cm | ||
| 490 | _a | ||
| 100 | _aSivaram, S. | ||
| 700 | _a | ||
| 650 | _a | ||
| 650 | _aMicroelectronics industry | ||
| 650 | _aChemical vapor deposition | ||
| 650 | _aMicroelectronics-Materials | ||
| 942 | _cBK | ||
| 942 | _2UDC | ||
| 999 |
_c64463 _d64463 |
||