| 000 | 00615 a2200265 4500 | ||
|---|---|---|---|
| 001 | 1010905 | ||
| 020 | _a0-471-00577-02 | ||
| 041 | _aeng | ||
| 080 | _a537.56Lie | ||
| 245 | _aPrinciples of plasma discharges and materials processing | ||
| 250 | _a | ||
| 260 | _aNew York | ||
| 260 | _bJohn Wiley | ||
| 260 | _c1994 | ||
| 300 | _axxvi,572 p. | ||
| 300 | _c23.5 cm | ||
| 490 | _a | ||
| 100 | _aLieberman, Michael A. | ||
| 700 | _aLichtenberg, Allan J. | ||
| 700 | _a- | ||
| 650 | _a- | ||
| 650 | _aPlasma dynamics ; Thin films-Surfaces ; Plasma etching ; Plasma chemistry | ||
| 942 | _cBK | ||
| 942 | _2UDC | ||
| 999 |
_c36414 _d36414 |
||