| 000 | 00664 a2200277 4500 | ||
|---|---|---|---|
| 001 | 91826 | ||
| 020 | _a978-0-471-72001-0 | ||
| 041 | _aeng | ||
| 080 | _a537.56Lie(2) | ||
| 245 | _aPrinciples of plasma discharges and materials processing | ||
| 250 | _a2nd ed | ||
| 260 | _aHoboken | ||
| 260 | _bJohn Wiley | ||
| 260 | _c2005 | ||
| 300 | _axxxv,757 | ||
| 300 | _c24 cm | ||
| 490 | _a | ||
| 100 | _aLieberman, Michael A. | ||
| 700 | _aLichtenberg, Allan J. | ||
| 700 | _a | ||
| 650 | _a | ||
| 650 | _aPhysics | ||
| 650 | _aPlasma dynamics , Plasma etching , Thin films-Surfaces , Plasma chemistry-Industrial applications | ||
| 942 | _cBK | ||
| 942 | _2UDC | ||
| 999 |
_c36409 _d36409 |
||