| 000 | 00619 a2200241 4500 | ||
|---|---|---|---|
| 001 | 306032 | ||
| 020 | _a | ||
| 041 | _aeng | ||
| 080 | _aLNBS SMT SP - 400 - 20 : 1975 | ||
| 245 | _aOptical and dimensional-measurement problems with photomasking in microelectronics | ||
| 250 | _a | ||
| 260 | _aWashington, D.C. | ||
| 260 | _bNational Bureau of standards | ||
| 260 | _c1975 | ||
| 300 | _a40 p. | ||
| 300 | _c | ||
| 856 | _uNBS | ||
| 490 | _aNBS SMT SP - 400 - 20 : 1975 | ||
| 700 | _a | ||
| 650 | _a | ||
| 650 | _aIntegrated circuits, Microelectronics, Micrometrology, Photolithography, Photomask | ||
| 942 | _cPP | ||
| 942 | _2UDC | ||
| 999 |
_c254552 _d254552 |
||