000 | 00744 a2200265 4500 | ||
---|---|---|---|
001 | 387058 | ||
020 | _a | ||
041 | _aeng | ||
080 | _a043:621.355Cho | ||
245 | _aDevelopment of inorganic-organic hybrid thin films by atomic and molecular layer deposition (R) | ||
250 | _a | ||
260 | _aMumbai | ||
260 | _bIIT | ||
260 | _c2017 | ||
300 | _axx,197 p. | ||
300 | _c30 cm | ||
490 | _a | ||
100 | _aChoudhury, Devika | ||
700 | _aSarkar, Shaibal K. and Rajaraman, Gopalan | ||
650 | _aSarkar, Shaibal K. and Rajaraman, Gopalan | ||
650 | _aTheses and Dissertations | ||
650 | _aElectrochemistry , Thin films , Atomic layer deposition , Chemical vapor deposition , Molecular beam epitaxy | ||
942 | _cTD | ||
942 | _2UDC | ||
999 |
_c238391 _d238391 |