| 000 | 00802 a2200265 4500 | ||
|---|---|---|---|
| 001 | 387042 | ||
| 020 | _a | ||
| 041 | _aeng | ||
| 080 | _a043:669.782:539.23Pan | ||
| 245 | _aGrowth and characterization of nanocrystalline silicon films using aluminum induced crystallization for piezoresistive applications (R) | ||
| 250 | _a | ||
| 260 | _aMumbai | ||
| 260 | _bIIT | ||
| 260 | _c2017 | ||
| 300 | _axii,113 p. | ||
| 300 | _c30 cm | ||
| 490 | _a | ||
| 100 | _aPandey, Vivek | ||
| 700 | _aDusane, R.O. and Gururajan, M.P. | ||
| 650 | _aDusane, R.O. and Gururajan, M.P. | ||
| 650 | _aTheses and Dissertations | ||
| 650 | _aSilicon crystals , Chemical vapor deposition , Thin films devices , Nanostructured materials , Polycrystalline semiconductors , Nanocrystals | ||
| 942 | _cTD | ||
| 942 | _2UDC | ||
| 999 |
_c238379 _d238379 |
||