000 01074 a2200313 4500
001 380296
003 OSt
005 20230513152404.0
008 230513b |||||||| |||| 00| 0 eng d
040 _cIITB
041 _aeng
080 _a043:621.382.3
_bBha
100 _aBhatt, Piyush Navinchandra
_eAuthor
_948496
245 _aGate stack and junction engineering for high performance ge MOSFETs (R)
260 _aBombay
260 _bIIT
260 _c2016
300 _axx,161 p.
300 _c30 cm
502 _aThesis
_bPh.D
_cIndian Institute of Technology Bombay. Department of Electrical Engineering
_d2016
650 _aLodha, Saurabh and Ganguly, Udayan
_948497
650 _aTheses and Dissertations
_921
650 _aMetal oxide semiconductor field-effect transistors
_98903
650 _aGermanium-Electric properties
_948498
700 _aLodha, Saurabh
_eSupervisor
_948499
700 _aGanguly, Udayan
_eSupervisor
_948500
710 _aIndian Institute of Technology Bombay
_b Department of Electrical Engineering
_964
942 _cTD
_2udc
999 _c237160
_d237160