| 000 | 00728 a2200265 4500 | ||
|---|---|---|---|
| 001 | 344739 | ||
| 020 | _a | ||
| 041 | _aeng | ||
| 080 | _a043:621.793:621.382Dig | ||
| 245 | _aGrowth and characterization of RF sputtered relaxor thin films for memory application (R) | ||
| 250 | _a | ||
| 260 | _aMumbai | ||
| 260 | _bIIT | ||
| 260 | _c1998 | ||
| 300 | _aii,49 p. | ||
| 300 | _c28 cm | ||
| 490 | _a | ||
| 100 | _aDighe, Sushma | ||
| 700 | _aKulkarni, A.R. and Srinivas, Raman | ||
| 650 | _aKulkarni, A.R. and Srinivas, Raman | ||
| 650 | _aTheses and Dissertations | ||
| 650 | _aFerroelectric thin films , Thin films-Electric properties , Ferroelectric storage cells , Sputtering(Physics) | ||
| 942 | _cTD | ||
| 942 | _2UDC | ||
| 999 |
_c228657 _d228657 |
||