000 | 00582 a2200265 4500 | ||
---|---|---|---|
001 | 303412 | ||
020 | _a | ||
041 | _aeng | ||
080 | _a043:621.382.3Poh | ||
245 | _aPlasma immersion ion implantation (R) | ||
250 | _a | ||
260 | _aMumbai | ||
260 | _bIIT | ||
260 | _c2011 | ||
300 | _avi,48 p. | ||
300 | _c30 cm | ||
490 | _a | ||
100 | _aPohekar, Prachi | ||
700 | _aPinto, R. | ||
650 | _aPinto, R. | ||
650 | _aTheses and Dissertations | ||
650 | _aMetal oxide semiconductor field-effect transistors , Ion implantation | ||
942 | _cTD | ||
942 | _2UDC | ||
999 |
_c216093 _d216093 |