| 000 | 00665 a2200265 4500 | ||
|---|---|---|---|
| 001 | 291551 | ||
| 020 | _a | ||
| 041 | _aeng | ||
| 080 | _a043:621.372:621.382Sri | ||
| 245 | _aDevelopment of low-k dielectric thin films for VLSI circuit applications (R) | ||
| 250 | _a | ||
| 260 | _aMumbai | ||
| 260 | _bIIT | ||
| 260 | _c2003 | ||
| 300 | _av,48 p. | ||
| 300 | _c30 cm | ||
| 490 | _a | ||
| 100 | _aSrivastava, Akhilesh Kumar | ||
| 700 | _aDusane, Rajiv O. | ||
| 650 | _aDusane, Rajiv O. | ||
| 650 | _aTheses and Dissertations | ||
| 650 | _aSilicon oxide films , Thin films , Integrated circuits-Very large scale integration | ||
| 942 | _cTD | ||
| 942 | _2UDC | ||
| 999 |
_c207701 _d207700 |
||