| 000 | 00616 a2200265 4500 | ||
|---|---|---|---|
| 001 | 277259 | ||
| 020 | _a | ||
| 041 | _aeng | ||
| 080 | _a043:621.382.3:537.226Sat | ||
| 245 | _aSputtered hafnium dioxide as high-k dielectric for sub 100nm MOSFETs (R) | ||
| 250 | _a | ||
| 260 | _aMumbai | ||
| 260 | _bIIT | ||
| 260 | _c2009 | ||
| 300 | _av,34 p. | ||
| 300 | _c30 cm | ||
| 490 | _a | ||
| 100 | _aSatish Meena | ||
| 700 | _aPinto, R. | ||
| 650 | _aPinto, R. | ||
| 650 | _aTheses and Dissertations | ||
| 650 | _aMetal oxide semiconductor field-effect Transistors , Dielectrics | ||
| 942 | _cTD | ||
| 942 | _2UDC | ||
| 999 |
_c205901 _d205901 |
||