000 | 00972 a2200277 4500 | ||
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001 | 275139 | ||
003 | OSt | ||
005 | 20230506150030.0 | ||
008 | 230506b |||||||| |||| 00| 0 eng d | ||
040 | _cIITB | ||
041 | _aeng | ||
080 |
_a043:621.382:620.168.3 _bRoy |
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100 |
_aRoy, Urmimala _eAuthor _947955 |
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245 | _aBottom-up approaches for nano-scale CMOS scaling (R) | ||
260 |
_aMumbai _bIIT _c2009 |
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300 |
_aix, 41 p. _c30 cm |
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502 |
_aThesis _bPh.D. _cIndian Institute of Technology Bombay. Department of Electrical Engineering _d2011 |
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650 |
_aMicroelectronics _947956 |
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650 |
_aMetal oxide semiconductors _92430 |
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650 |
_aComplementary _9394 |
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650 |
_aNanostructured materials _9570 |
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650 |
_a Metal oxide semiconductor field-effect transistors _98903 |
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700 |
_aRao, Ramgopal V. _eSupervisor _947957 |
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710 |
_aIndian Institute of Technology Bombay. _bDepartment of Electrical Engineering _964 |
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942 |
_cTD _2udc |
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999 |
_c205632 _d205632 |