| 000 | 00637 a2200265 4500 | ||
|---|---|---|---|
| 001 | 267407 | ||
| 020 | _a | ||
| 041 | _aeng | ||
| 080 | _a043:621.793:536.7Adh | ||
| 245 | _aThemodynamic and kinetic investigation of the HWCVD process (R) | ||
| 250 | _a | ||
| 260 | _aMumbai | ||
| 260 | _bIIT | ||
| 260 | _c2009 | ||
| 300 | _axv,81 p. | ||
| 300 | _c30 cm | ||
| 490 | _a | ||
| 100 | _aAdhikari, Subhra | ||
| 700 | _aDusane, R.O. and Viswanathan, N.N. | ||
| 650 | _aDusane, R.O. and Viswanathan, N.N. | ||
| 650 | _aTheses and Dissertations | ||
| 650 | _aThermodynamics , Chemical vapour deposition | ||
| 942 | _cTD | ||
| 942 | _2UDC | ||
| 999 |
_c204830 _d204830 |
||