| 000 | 00673 a2200265 4500 | ||
|---|---|---|---|
| 001 | 222120 | ||
| 020 | _a | ||
| 041 | _aeng | ||
| 080 | _a043:669.782:621.793Swa | ||
| 245 | _aStudy of hydrogenated amorphous silicon carbon (a-SiC:H) alloy film deposited by hot wire chemical vapor deposition (HWCVD) (R) | ||
| 250 | _a | ||
| 260 | _aMumbai | ||
| 260 | _bIIT | ||
| 260 | _c2006 | ||
| 300 | _aviii,120 p. | ||
| 300 | _c28 cm | ||
| 490 | _a | ||
| 100 | _aSwain, Bibhu Prasad | ||
| 700 | _aDusane, Rajiv O. | ||
| 650 | _aDusane, Rajiv O. | ||
| 650 | _aTheses and Dissertations | ||
| 650 | _aChemical vapour deposition , Silicon alloys | ||
| 942 | _cTD | ||
| 942 | _2UDC | ||
| 999 |
_c194834 _d194834 |
||