| 000 | 00657 a2200265 4500 | ||
|---|---|---|---|
| 001 | 219190 | ||
| 020 | _a | ||
| 041 | _aeng | ||
| 080 | _a043:621.372:621.382Sin | ||
| 245 | _aDevelopment of low dielectric constant thin film for VLSI applications (R) | ||
| 250 | _a | ||
| 260 | _aMumbai | ||
| 260 | _bIIT | ||
| 260 | _c2006 | ||
| 300 | _ax,127 p. | ||
| 300 | _c30 cm | ||
| 490 | _a | ||
| 100 | _aSingh, Sunil Kumar | ||
| 700 | _aDusane, Rajiv O. | ||
| 650 | _aDusane, Rajiv O. | ||
| 650 | _aTheses and Dissertations | ||
| 650 | _aCopper , Dielectrics , Thin films , Integrated circuits-Very large scale integration | ||
| 942 | _cTD | ||
| 942 | _2UDC | ||
| 999 |
_c194050 _d194050 |
||