| 000 | 00710 a2200265 4500 | ||
|---|---|---|---|
| 001 | 95054 | ||
| 020 | _a | ||
| 041 | _aeng | ||
| 080 | _a043:621.382.3Ran | ||
| 245 | _aNovel unit process development and their integration for sub-0.25 um MNSFET/MOSFET development (R) | ||
| 250 | _a | ||
| 260 | _aMumbai | ||
| 260 | _bIIT | ||
| 260 | _c2004 | ||
| 300 | _axii,48 p. | ||
| 300 | _c30 cm | ||
| 490 | _a | ||
| 100 | _aRana, Amit Kumar | ||
| 700 | _aRao, V. Ramgopal and Dusane, Rajiv O. | ||
| 650 | _aRao, V. Ramgopal and Dusane, Rajiv O. | ||
| 650 | _aTheses and Dissertations | ||
| 650 | _aChemical vapour deposition , Metal oxide semiconductor field-effect transistors | ||
| 942 | _cTD | ||
| 942 | _2UDC | ||
| 999 |
_c184548 _d184548 |
||