| 000 | 00716 a2200265 4500 | ||
|---|---|---|---|
| 001 | 93058 | ||
| 020 | _a | ||
| 041 | _aeng | ||
| 080 | _a043:669.782:621.382Jos | ||
| 245 | _aProcess integration issues with plasma immersion ion implantation for CMOS technologies (R) | ||
| 250 | _a | ||
| 260 | _aMumbai | ||
| 260 | _bIIT | ||
| 260 | _c2004 | ||
| 300 | _aviii,69 p. | ||
| 300 | _c30 cm | ||
| 490 | _a | ||
| 100 | _aJoshi, Anand | ||
| 700 | _aDusane, R.O. and Ramgopal Rao, V. | ||
| 650 | _aDusane, R.O. and Ramgopal Rao, V. | ||
| 650 | _aTheses and Dissertations | ||
| 650 | _aChemical vapour deposition , Metal oxide semiconductors, Complementary , Silicon nitride coatings | ||
| 942 | _cTD | ||
| 942 | _2UDC | ||
| 999 |
_c182313 _d182314 |
||