| 000 | 00648 a2200265 4500 | ||
|---|---|---|---|
| 001 | 92592 | ||
| 020 | _a | ||
| 041 | _aeng | ||
| 080 | _a043:669.782:539.23Din | ||
| 245 | _aSimulation of the hot wire CVD process of Si:H thin film deposition (R) | ||
| 250 | _a | ||
| 260 | _aMumbai | ||
| 260 | _bIIT | ||
| 260 | _c2004 | ||
| 300 | _avi,59 p. | ||
| 300 | _c30 cm | ||
| 490 | _a | ||
| 100 | _aDinesh Chandra | ||
| 700 | _aDusane, R.O. and Viswanathan, N.N. | ||
| 650 | _aDusane, R.O. and Viswanathan, N.N. | ||
| 650 | _aTheses and Dissertations | ||
| 650 | _aThin films , Chemical vapour deposition , Silane | ||
| 942 | _cTD | ||
| 942 | _2UDC | ||
| 999 |
_c181796 _d181796 |
||