| 000 | 00652 a2200265 4500 | ||
|---|---|---|---|
| 001 | 91612 | ||
| 020 | _a | ||
| 041 | _aeng | ||
| 080 | _a043:669.782:539.23Pat | ||
| 245 | _aStudy of hot wire chemical vapour deposited a-si:H and its alloys (R) | ||
| 250 | _a | ||
| 260 | _aMumbai | ||
| 260 | _bIIT | ||
| 260 | _c2003 | ||
| 300 | _ax,117 p. | ||
| 300 | _c28 cm | ||
| 490 | _a | ||
| 100 | _aPatil, Samadhan Bhaulal | ||
| 700 | _aDusane, R.O. and Misra, D.S. | ||
| 650 | _aDusane, R.O. and Misra, D.S. | ||
| 650 | _aTheses and Dissertations | ||
| 650 | _aChemical vapour deposition , Silicon devices , Thin films | ||
| 942 | _cTD | ||
| 942 | _2UDC | ||
| 999 |
_c181366 _d181366 |
||