000 | 00820 a2200253 4500 | ||
---|---|---|---|
001 | 60314 | ||
003 | OSt | ||
005 | 20230429161203.0 | ||
008 | 230429b |||||||| |||| 00| 0 eng d | ||
020 | _a0 | ||
040 | _cIITB | ||
041 | _aeng | ||
080 |
_a043:621.382 _bPat |
||
100 |
_aPatrikar, R. _eAuthor _947469 |
||
245 | _aHigh-field stressing of oxides in MOS structures (R) | ||
260 |
_aBombay _c1992 _bIIT |
||
300 |
_a265 p. _c28 cm |
||
502 |
_aThesis
_bPh.D. _cIndian Institute of Technology Bombay. Department of Electrical Engineering _d1992 |
||
650 | 0 |
_aTheses and Dissertations _921 |
|
650 | 0 |
_aMetal oxide semiconductors _92430 |
|
700 |
_aLal, R. _e Supervisor _918916 |
||
710 |
_964 _aIndian Institute of Technology Bombay. _bDepartment of Electrical Engineering |
||
942 |
_cTD _2udc |
||
999 |
_c171664 _d171664 |