| 000 | 00648 a2200265 4500 | ||
|---|---|---|---|
| 001 | 56564 | ||
| 020 | _a0 | ||
| 041 | _aeng | ||
| 080 | _a043:621.382Dix | ||
| 245 | _aPreparation and characterization of plasma enhanced chemical vapor deposited silicon dioxide and poly-oxide films (R) | ||
| 250 | _a | ||
| 260 | _aBombay | ||
| 260 | _bIIT | ||
| 260 | _c1991 | ||
| 300 | _a207 p. | ||
| 300 | _c27 cm | ||
| 490 | _a | ||
| 100 | _aDixit, B.B. | ||
| 700 | _aSrivastava, C.M. and Khokle, W.S. | ||
| 650 | _aSrivastava, C.M. and Khokle, W.S. | ||
| 650 | _aTheses and Dissertations | ||
| 650 | _aSilicon Dioxide | ||
| 942 | _cTD | ||
| 942 | _2UDC | ||
| 999 |
_c169601 _d169601 |
||