| 000 | 00602 a2200265 4500 | ||
|---|---|---|---|
| 001 | 36509 | ||
| 020 | _a0 | ||
| 041 | _aeng | ||
| 080 | _a043:621.372:621.382Raj | ||
| 245 | _aGrowth and characterization of low pressure chemical vapor deposited polycrystalline silicon films (R) | ||
| 250 | _a | ||
| 260 | _aBombay | ||
| 260 | _bIIT | ||
| 260 | _c1987 | ||
| 300 | _ap.47, 28cm | ||
| 300 | _c | ||
| 490 | _a | ||
| 100 | _aRajagopal, R. | ||
| 700 | _aChandorkar, A.N. | ||
| 650 | _aChandorkar, A.N. | ||
| 650 | _aTheses and Dissertations | ||
| 650 | _aThin films | ||
| 942 | _cTD | ||
| 942 | _2UDC | ||
| 999 |
_c165574 _d165574 |
||