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Thermal oxidation of silicon in dry oxygen growth kinetics and charge characterization in the thin regime

by Massoud, Hisham Zakaria | .

Series: Edition: Language: English Publication details: n.p. ; Stanford Univ., ; 1983Availability: Items available for loan: 1 Call number: 621.372:621.382 Mas.

Silicon VLSI technology : fundamentals, practice and modeling

by Plummer, James D | Deal, Michael | Griffin, Peter D | .

Series: Prentice Hall electronics and VLSI seriesEdition: Language: English Publication details: New Delhi ; Pearson Education ; 2009Availability: Items available for loan: 3 Call number: 621.372:621.382Plu(4), ... Not available: Checked out (13).
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Silicon VLSI technology : fundamentals, practice and modeling

by Plummer, James D | Deal, Michael D | Griffin, Peter B | .

Series: Prentice Hall electronics and VLSI seriesEdition: Language: English Publication details: Upper Saddle River ; Prentice-Hall ; 2000Availability: Not available: Checked out (1).

Development of low-k dielectric thin films for VLSI circuit applications (R)

by Srivastava, Akhilesh Kumar | Dusane, Rajiv O.

Series: Edition: Language: English Publication details: Mumbai ; IIT ; 2003Availability: Items available for reference: Not for loan (1) Call number: 043:621.372:621.382Sri.

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